Step heightThe accurate and repeatable measurement of step height is necessary for many hi-tech applications. Taylor Hobson provide a range of instrument designed to meet the very highest requirements for step height measurement. Covering ranges of step height from sub-nanometer to millimetre with repeatability below 0.1 nm. Metrology 3D Step Height Provides the height difference between two planes defined by two areas on a surface. The first area is defined as the reference and the software fits a least squares plane through this area. The second plane is then measured from this. As well as mean step height, maximum height and minimum height, the angle difference is also measured.
2D Step Height
ISO 5436-1 Step Height |
MEMS & nanotechnologyMicro Electro-Mechanical Systems are being used today for numerous applications including pressure and acceleration sensors, micro mirror display devices and micro fluidic pumps. MEMS devices extend the fabrication techniques used by the integrated circuit industry to create mechanical elements such as gears, diaphragms and connecting beams. Accurate measurement of all these elements is critical to meet the demand of mass producing low cost high quality MEMS devices. Metrology Roughness Accurate measurement of roughness within MEMS devices allows surface interactions to be controlled, whether they are solid to solid interactions as in micro gear systems or solid to liquid as found in micro fluid pumps.
Step Height
Lateral Dimensions |
Laser etch measurementLaser etching is one of the predominant methods used for the identification marking of integrated circuits. This is partly due to the fact that laser marking is a tamper proof method of identification. Tamper proof marking has helped greatly reduce IC fraud, the selling of IC is for higher speeds and specifications than they were produced for. Metrology Step Height As IC packages have become smaller and thinner the requirement for measuring step height of laser etching has become more important. The target depth of the laser etch is defined by two requirements. Firstly, it must be deep enough to provide tamper proof marking that can be read by IC identification systems and secondly, it must be shallow enough not to damage the circuits on the chip.
Roughness |
Epitaxial wafersDue to the expansion in the use of electro-optical components that are now common place in both telecommunications and display technologies, epitaxy is emerging as a key technique for component production. Epitaxy is the process of depositing very thin layers of semiconductor materials onto the surface of a single crystal substrate. Each crystal layer is known as an epilayer. Metrology Surface Roughness Surface texture is a vitally important parameter in specifying the quality of epitaxial semiconductors for both customers and suppliers. With the current drive for ever smaller circuits to be printed on wafers, the tolerances for roughness are becoming tighter. Surface finish for epiwafers is specified in nm, this requires a system with very low noise and high resolution be used to measure them. |
IC package measurementBackend process measurement is important for controlling the final quality of the IC package. Problems in IC packaging can cause connection issues when the device is soldered, detaching of wire bonds or bump on chip contacts and increased stress to be placed on the circuits of the IC. For these reasons it is important to control not just the geometry of the die, but also the flatness of the die seating area, the step height between the attachment points on the die and the package and the roughness of the wire bond attachment areas. Metrology Flatness Matching the flatness of the die with that of the die seating area is important to reduce stress placed on the IC during the packaging process and throughout the operation of the device. Controlling the flatness of the overall package is also necessary to ensure correct placement of the IC and good electrical contact being made when soldered.
Roughness
Step Height |